Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2650-2656

  Hastings, J T ^a,b   Zhang, Feng ^a   Smith, Henry I ^a  

^a Department of Electrical Engineering and Computer Science   (United States)

^b UNIVERSITY OF KENTUCKY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CLOSED LOOP CONTROL SYSTEMS; COHERENT LIGHT; DIFFRACTION GRATINGS; FEEDBACK CONTROL; INTERFEROMETERS; LASER APPLICATIONS; MIRRORS; OPTICAL RESOLVING POWER; PHOTONS; POLYMETHYL METHACRYLATES; REAL TIME SYSTEMS; SCANNING; SIGNAL PROCESSING; SIGNAL TO NOISE RATIO;

SCANNING-ELECTRON-BEAM LITHOGRAPHY (SEBL); SPATIAL-PHASE LOCKING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0942278362     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1622944     Document Type: Conference Paper

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