Distributed axis electron-beam system for lithography and inspection-preliminary experimental results

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2662-2665

  Pickard, D S ^a   Campbell, C ^a   Crane, T ^a   Cruz Rivera, L J ^a   Davenport, A ^a   Meisburger, W D ^a   Pease, R F W ^a   Groves, T R ^b  

^a STANFORD UNIVERSITY   (United States)

^b Vistec Electron Beam GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CYCLOTRONS; ELECTRIC SPACE CHARGE; ELECTRON BEAMS; ELECTRON EMISSION; IMAGE QUALITY; MAGNETIC FIELD EFFECTS; NUMERICAL METHODS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SURFACES;

APERTURE SIZE; DISTRIBUTED AXIS ELECTRON SYSTEM; ELECTRON CYLCLOTRON ORBIT;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036883136     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520566     Document Type: Article

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