Optimization of a lithographic and ion beam etching process for nanostructuring magnetoresistive thin film stacks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3539-3543

  Walsh, Michael E ^a,b   Hao, Yaowu ^a   Ross, C A ^a   Smith, Henry I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Bldg 39 427   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; ARGON; COBALT; ETCHING; ION BEAMS; LITHOGRAPHY; MAGNETIC STORAGE; MAGNETORESISTANCE; MULTILAYERS; NANOSTRUCTURED MATERIALS; RANDOM ACCESS STORAGE;

ION BEAM ETCHING;

MAGNETIC THIN FILM DEVICES;

EID: 0034315953     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1324639     Document Type: Article

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