X-ray diffraction study on residual stress and preferred orientation in thin titanium films subjected to a high ion flux during deposition

Journal of Applied Physics

Volumn 96, Issue 12, 2004, Pages 7202-7211

  Birkholz, M ^a,c   Genzel, C ^b   Jung, T ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

^c IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LOAD STRESS; POLE FIGURE ANALYSIS; PREFERRED GRAIN ORIENTATION (PO); X-RAY REFLECTROMETRY;

COMPRESSIVE STRESS; CRYSTALLOGRAPHY; ION BOMBARDMENT; METALLIC FILMS; SPUTTERING; X RAY DIFFRACTION; X RAY SCATTERING;

RESIDUAL STRESSES;

EID: 11144230518     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1814413     Document Type: Article

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