Depth-resolved X-ray residual stress analysis in PVD (Ti, Cr) N hard coatings

Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 94, Issue 6, 2003, Pages 655-661

  Genzel, Christoph ^a   Reimers, Walter ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Residual stress; Thin films; X ray diffraction

Indexed keywords

FILM GROWTH; PHYSICAL VAPOR DEPOSITION; REACTION KINETICS; RESIDUAL STRESSES; STRESS ANALYSIS; STRESS CONCENTRATION; THERMAL EXPANSION; THIN FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

THERMAL EQUILIBRIUM; THERMAL RESIDUAL STRESS;

COATINGS;

EID: 0742330797     PISSN: 00443093     EISSN: None     Source Type: Journal    
DOI: 10.3139/146.030655     Document Type: Article

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