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Thin Solid Films

Volumn 295, Issue 1-2, 1997, Pages 60-66

Influence of substrate properties on the growth of titanium films. Part I

(2) Poppeller, M a Abermann, R a

a UNIVERSITY OF INNSBRUCK (Austria)

Author keywords

Internal stress; Substrate properties; Titanium films

Indexed keywords

COMPOSITION EFFECTS; COMPRESSIVE STRENGTH; DEPOSITION; EVAPORATION; FILM GROWTH; HYDROGEN; NUCLEATION; RESIDUAL STRESSES; SUBSTRATES; TENSILE STRENGTH; THIN FILMS; WATER;

CANTILEVER BEAM TECHNIQUE; REACTIVE EVAPORATION; ULTRAHIGH VACUUM PROCESS;

TITANIUM;

EID: 0031074702 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09142-0 Document Type: Article

Times cited : (13)

References (16)

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3
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5
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6
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- Abermann, R.¹ Koch, R.² Martinz, H.P.³

7
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- Abermann, R.¹

8
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- Koch, R.¹

9
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10
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12
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13
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14
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15
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- in press
- M. Poppeller and R. Abermann, Thin Solid Films, in press.
- Thin Solid Films
- Poppeller, M.¹ Abermann, R.²

16
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- Thurner, G.¹ Abermann, R.²

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