Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics

Volumn 88, Issue 7, 2000, Pages 4376-4379

  Birkholz, M ^a   Selle, B ^a   Conrad, E ^a   Lips, K ^a   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001450948     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289783     Document Type: Article

References (28)

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