Highly 〈100〉-oriented growth of polycrystalline silicon films on glass by pulsed magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 2004-2006

  Reinig, P ^a   Selle, B ^a   Fenske, F ^a   Fuhs, W ^a   Alex, V ^b   Birkholz, M ^c  

^a HAHN MEITNER INSTITUT   (Germany)

^b LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

^c INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; POLYSILICON; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

GRAIN ORIENTATIONS;

THIN FILMS;

EID: 0036865511     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1513634     Document Type: Article

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