Gas flow sputtering of oxide coatings: Practical aspects of the process

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 218-224

  Jung, Th ^a   Kalber T ^a   Heide, V V D ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Gas flow sputtering; Hard coatings; High rate deposition

Indexed keywords

ALUMINUM; DIFFUSION; FLOW OF FLUIDS; GLOW DISCHARGES; INERT GASES; PROTECTIVE COATINGS; SUPERCONDUCTING FILMS; TITANIUM; ZIRCONIUM;

HARD COATINGS; HIGH RATE DEPOSITION; HOLLOW CATHODE GLOW DISCHARGE; INERT GAS FLOW; REACTIVE GAS FLOW SPUTTERING; THREE DIMENSIONAL BEHAVIOR;

SPUTTERING;

EID: 0030379459     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03043-5     Document Type: Article

References (4)

1. K. Ishii, J. Vac. Sci. Technol., A 7 (1989) 256.
2. T. Jung and A. Westphal, Mater. Sci. Eng., A 140 (1991) 528.
3. T. Jung and A. Westphal, Surf. Coat. Technol., 59 (1993) 171.
4. R.E. Somekh, J. Vac. Sci. Technol., A 2 (1984) 1285.