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Volumn 25, Issue 12, 2004, Pages 801-803

Schottky-Barrier source/drain MOSFETs on ultrathin SOI body with a tungsten metallic midgap gate

Author keywords

Metal gate; Schottky barrier (SB) MOSFET; Silicon on insulator (SOI)

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ENCAPSULATION; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SILICA; SILICON ON INSULATOR TECHNOLOGY; THIN FILMS; THRESHOLD VOLTAGE; TUNGSTEN;

EID: 10844225390     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2004.838053     Document Type: Article
Times cited : (57)

References (25)
  • 2
    • 0042855935 scopus 로고    scopus 로고
    • "Performance advantage of Schottky source/drain in ultrathin-body silicon-on-insulator and dual-gate CMOS"
    • Sept
    • D. Connelly, C. Faulkner, and D. E. Grupp, "Performance advantage of Schottky source/drain in ultrathin-body silicon-on-insulator and dual-gate CMOS," IEEE Trans. Electron Devices, vol. 50, pp. 1340-1345, Sept. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , pp. 1340-1345
    • Connelly, D.1    Faulkner, C.2    Grupp, D.E.3
  • 3
    • 0033734588 scopus 로고    scopus 로고
    • "Series resistance limits for 0.05 μm MOSFETs"
    • P. Keys, H. J. Gossman, K. K. Ng, and C. S. Rafferty, "Series resistance limits for 0.05 μm MOSFETs," Superlatt. Microstruct., vol. 27, no. 2/3, pp. 125-136, 2000.
    • (2000) Superlatt. Microstruct. , vol.27 , Issue.2-3 , pp. 125-136
    • Keys, P.1    Gossman, H.J.2    Ng, K.K.3    Rafferty, C.S.4
  • 5
    • 3142672426 scopus 로고    scopus 로고
    • "Measurement of low Schottky barrier heights applied to metallic source/drain metal-oxide-semiconductor field effect"
    • E. Dubois and G. Larrieu, "Measurement of low Schottky barrier heights applied to metallic source/drain metal-oxide-semiconductor field effect," J. Appl. Phys., vol. 96, pp. 729-737, 2004.
    • (2004) J. Appl. Phys. , vol.96 , pp. 729-737
    • Dubois, E.1    Larrieu, G.2
  • 7
    • 0034453418 scopus 로고    scopus 로고
    • "Complementary silicide source/drain thin-body MOSFETs for the 20-nm gate length regime"
    • J. Kedzierski, P. Xuan, E. H. Anderson, J. Bokor, T. J. King, and C. Hu, "Complementary silicide source/drain thin-body MOSFETs for the 20-nm gate length regime," in IEDM Tech. Dig., 2000, pp. 57-60.
    • (2000) IEDM Tech. Dig. , pp. 57-60
    • Kedzierski, J.1    Xuan, P.2    Anderson, E.H.3    Bokor, J.4    King, T.J.5    Hu, C.6
  • 10
    • 0037967604 scopus 로고    scopus 로고
    • "Suppression of leakage current in schottky battier metal-oxide-semiconductor field-effect transistors"
    • L. E. Calvet, H. Luebben, M. A. Reed, C. Wang, J. P. Snyder, and J. R. Tucker, "Suppression of leakage current in schottky battier metal-oxide-semiconductor field-effect transistors," J. Appl. Phys. vol. 91, no. 2, pp. 757-759, 2002.
    • (2002) J. Appl. Phys. , vol.91 , Issue.2 , pp. 757-759
    • Calvet, L.E.1    Luebben, H.2    Reed, M.A.3    Wang, C.4    Snyder, J.P.5    Tucker, J.R.6
  • 11
    • 51149208592 scopus 로고
    • "Experimental investigation of a PtSi source and drain field emission transistor"
    • J. Snyder, C. R. Helms, and Y. Nishi, "Experimental investigation of a PtSi source and drain field emission transistor," Appl. Phys. Lett. vol. 67, no. 10, pp. 1420-1422, 1995.
    • (1995) Appl. Phys. Lett. , vol.67 , Issue.10 , pp. 1420-1422
    • Snyder, J.1    Helms, C.R.2    Nishi, Y.3
  • 12
    • 0033593712 scopus 로고    scopus 로고
    • "Sub-40-nm PtSi Schottky source/drain metal-oxide-semiconductor-field-effect transistors"
    • C. Wang, J. Snyder, and J. R. Tucker, "Sub-40-nm PtSi Schottky source/drain metal-oxide-semiconductor-field-effect transistors," Appl. Phys. Lett., vol. 74, pp. 1174-1176, 1999.
    • (1999) Appl. Phys. Lett. , vol.74 , pp. 1174-1176
    • Wang, C.1    Snyder, J.2    Tucker, J.R.3
  • 13
    • 0033750787 scopus 로고    scopus 로고
    • "Simulation of Schottky barrier MOSFETs with a coupled quantum injection/Monte Carlo technique"
    • June
    • B. Winstead and U. Ravaioli, "Simulation of Schottky barrier MOSFETs with a coupled quantum injection/Monte Carlo technique," IEEE Trans. Electron Devices, vol. 47, pp. 1241-1246, June 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 1241-1246
    • Winstead, B.1    Ravaioli, U.2
  • 14
    • 0032672720 scopus 로고    scopus 로고
    • "35-nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate"
    • B
    • W. Saitoh, S. Yamagami, A. Itoh, and M. Asada, "35-nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate," Jpn. J. Appl. Phys., vol. 38, no. 6A/B, pp. 629-631, 1999.
    • (1999) Jpn. J. Appl. Phys. , vol.38 , Issue.6 A , pp. 629-631
    • SaItoh, W.1    Yamagami, S.2    Itoh, A.3    Asada, M.4
  • 15
    • 0034317576 scopus 로고    scopus 로고
    • "A 20-nm gate-length ultra-thin body p-MOSFET with silicide source /drain"
    • J. Kedzierski, P. Xuan, V. Subramanian, J. Bokor, T. J. King, and C. Hu, "A 20-nm gate-length ultra-thin body p-MOSFET with silicide source/drain," Superlatt. Microstruct., vol. 28, no. 5/6, pp. 445-452, 2000.
    • (2000) Superlatt. Microstruct. , vol.28 , Issue.5-6 , pp. 445-452
    • Kedzierski, J.1    Xuan, P.2    Subramanian, V.3    Bokor, J.4    King, T.J.5    Hu, C.6
  • 19
    • 0033579765 scopus 로고    scopus 로고
    • 2/Si(100) for ultrashort channel Schottky barrier metal-oxide-semiconductor field effect transistors"
    • 2/Si(100) for ultrashort channel Schottky barrier metal-oxide-semiconductor field effect transistors," Appl. Phys. Lett., vol. 74, no. 3, pp. 454-456, 1999.
    • (1999) Appl. Phys. Lett. , vol.74 , Issue.3 , pp. 454-456
    • Zhao, Q.T.1    Klinkhammer, F.2    Dolle, M.3    Kappius, L.4    Mantl, S.5
  • 20
    • 0346280181 scopus 로고    scopus 로고
    • "Formation of platinum-based silicide contacts: Kinetics, stoichiometry and current drive capabilities"
    • G. Larrieu, E. Dubois, X. Wallart, X. Baie, and J. Katcki, " Formation of platinum-based silicide contacts: Kinetics, stoichiometry and current drive capabilities," J. Appl. Phys., vol. 94, pp. 7801-7810, 2003.
    • (2003) J. Appl. Phys. , vol.94 , pp. 7801-7810
    • Larrieu, G.1    Dubois, E.2    Wallart, X.3    Baie, X.4    Katcki, J.5
  • 21
    • 0036642907 scopus 로고    scopus 로고
    • "Low Schottky barrier source/drain for advanced MOS architecture: Device design and material considerations"
    • E. Dubois and G. Larrieu, "Low Schottky barrier source/drain for advanced MOS architecture: Device design and material considerations," Solid State Electron., vol. 46, pp. 997-1004, 2002.
    • (2002) Solid State Electron. , vol.46 , pp. 997-1004
    • Dubois, E.1    Larrieu, G.2
  • 23
    • 0034272926 scopus 로고    scopus 로고
    • "An ultra-thin midgap gate FDSOI MOSFET"
    • H. Shang and M. H. White, "An ultra-thin midgap gate FDSOI MOSFET," Solid State Electron., vol. 44, no. 9, pp. 1621-1625, 2000.
    • (2000) Solid State Electron. , vol.44 , Issue.9 , pp. 1621-1625
    • Shang, H.1    White, M.H.2
  • 24
    • 0026908041 scopus 로고
    • "Extended theoritical analysis of the steady-state linear behavior of accumulation-mode, long-channel p-MOSFETs on SOI substrates"
    • D. Flandre and A. Terao, "Extended theoritical analysis of the steady-state linear behavior of accumulation-mode, long-channel p-MOSFETs on SOI substrates," Solid State Electron., vol. 35, no. 8, pp. 1085-1092, 1992.
    • (1992) Solid State Electron. , vol.35 , Issue.8 , pp. 1085-1092
    • Flandre, D.1    Terao, A.2
  • 25
    • 0024770731 scopus 로고
    • "Submicrometer near-intrinsic thin-film SOI complementary MOSFETs"
    • Nov
    • C. T. Lee and K. K. Young, "Submicrometer near-intrinsic thin-film SOI complementary MOSFETs," IEEE Trans. Electron Devices, vol. 36, pp. 2537-2547, Nov. 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 2537-2547
    • Lee, C.T.1    Young, K.K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.