-
2
-
-
0042855935
-
"Performance advantage of Schottky source/drain in ultrathin-body silicon-on-insulator and dual-gate CMOS"
-
Sept
-
D. Connelly, C. Faulkner, and D. E. Grupp, "Performance advantage of Schottky source/drain in ultrathin-body silicon-on-insulator and dual-gate CMOS," IEEE Trans. Electron Devices, vol. 50, pp. 1340-1345, Sept. 2003.
-
(2003)
IEEE Trans. Electron Devices
, vol.50
, pp. 1340-1345
-
-
Connelly, D.1
Faulkner, C.2
Grupp, D.E.3
-
3
-
-
0033734588
-
"Series resistance limits for 0.05 μm MOSFETs"
-
P. Keys, H. J. Gossman, K. K. Ng, and C. S. Rafferty, "Series resistance limits for 0.05 μm MOSFETs," Superlatt. Microstruct., vol. 27, no. 2/3, pp. 125-136, 2000.
-
(2000)
Superlatt. Microstruct.
, vol.27
, Issue.2-3
, pp. 125-136
-
-
Keys, P.1
Gossman, H.J.2
Ng, K.K.3
Rafferty, C.S.4
-
4
-
-
0037600562
-
"What are the limiting parameters of deep-submicron MOSFETs for high frequency applications?"
-
Feb
-
G. Dambrine, C. Raynaud, D. Lederer, M. Dehan, O. Rozeaux, M. Vanmackelberg, F. Danneville, S. Lepilliet, and J. P. Raskin, "What are the limiting parameters of deep-submicron MOSFETs for high frequency applications?," IEEE Electron Device Lett., vol. 24, pp. 189-191, Feb. 2003.
-
(2003)
IEEE Electron Device Lett.
, vol.24
, pp. 189-191
-
-
Dambrine, G.1
Raynaud, C.2
Lederer, D.3
Dehan, M.4
Rozeaux, O.5
Vanmackelberg, M.6
Danneville, F.7
Lepilliet, S.8
Raskin, J.P.9
-
5
-
-
3142672426
-
"Measurement of low Schottky barrier heights applied to metallic source/drain metal-oxide-semiconductor field effect"
-
E. Dubois and G. Larrieu, "Measurement of low Schottky barrier heights applied to metallic source/drain metal-oxide-semiconductor field effect," J. Appl. Phys., vol. 96, pp. 729-737, 2004.
-
(2004)
J. Appl. Phys.
, vol.96
, pp. 729-737
-
-
Dubois, E.1
Larrieu, G.2
-
6
-
-
1942455769
-
T = 280 GHz"
-
Mar
-
T = 280 GHz," IEEE Electron Device Lett., vol. 25, pp. 220-222, Mar. 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, pp. 220-222
-
-
Fritze, M.1
Chen, C.2
Calawa, S.3
Yost, D.4
Wheeler, B.5
Wyatt, P.6
Keast, C.7
Snyder, J.8
Larson, J.9
-
7
-
-
0034453418
-
"Complementary silicide source/drain thin-body MOSFETs for the 20-nm gate length regime"
-
J. Kedzierski, P. Xuan, E. H. Anderson, J. Bokor, T. J. King, and C. Hu, "Complementary silicide source/drain thin-body MOSFETs for the 20-nm gate length regime," in IEDM Tech. Dig., 2000, pp. 57-60.
-
(2000)
IEDM Tech. Dig.
, pp. 57-60
-
-
Kedzierski, J.1
Xuan, P.2
Anderson, E.H.3
Bokor, J.4
King, T.J.5
Hu, C.6
-
8
-
-
2442623512
-
κ gate dielectrics and metal-gate electrode"
-
Apr
-
κ gate dielectrics and metal-gate electrode," IEEE Electron Device Lett., vol. 25, pp. 268-270, Apr. 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, pp. 268-270
-
-
Zhu, S.1
Yu, H.2
Whang, S.3
Chen, J.4
Shen, C.5
Chan, D.6
Yoo, W.7
Du, A.8
Tung, C.9
Singh, J.10
Chin, A.11
Kwong, D.12
-
9
-
-
3943066406
-
"N-type Schottky barrier source/drain MOSFET using ytterbium silicide"
-
June
-
S. Zhu, J. Chen, M.-F. Li, S. J. Lee, J. Singh, C. X. Zhu, A. Du, C. H. Tung, A. Chin, and D. Kwong, "N-type Schottky barrier source/drain MOSFET using ytterbium silicide," IEEE Electron Device Lett., vol. 25, pp. 565-567, June 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, pp. 565-567
-
-
Zhu, S.1
Chen, J.2
Li, M.-F.3
Lee, S.J.4
Singh, J.5
Zhu, C.X.6
Du, A.7
Tung, C.H.8
Chin, A.9
Kwong, D.10
-
10
-
-
0037967604
-
"Suppression of leakage current in schottky battier metal-oxide-semiconductor field-effect transistors"
-
L. E. Calvet, H. Luebben, M. A. Reed, C. Wang, J. P. Snyder, and J. R. Tucker, "Suppression of leakage current in schottky battier metal-oxide-semiconductor field-effect transistors," J. Appl. Phys. vol. 91, no. 2, pp. 757-759, 2002.
-
(2002)
J. Appl. Phys.
, vol.91
, Issue.2
, pp. 757-759
-
-
Calvet, L.E.1
Luebben, H.2
Reed, M.A.3
Wang, C.4
Snyder, J.P.5
Tucker, J.R.6
-
11
-
-
51149208592
-
"Experimental investigation of a PtSi source and drain field emission transistor"
-
J. Snyder, C. R. Helms, and Y. Nishi, "Experimental investigation of a PtSi source and drain field emission transistor," Appl. Phys. Lett. vol. 67, no. 10, pp. 1420-1422, 1995.
-
(1995)
Appl. Phys. Lett.
, vol.67
, Issue.10
, pp. 1420-1422
-
-
Snyder, J.1
Helms, C.R.2
Nishi, Y.3
-
12
-
-
0033593712
-
"Sub-40-nm PtSi Schottky source/drain metal-oxide-semiconductor-field-effect transistors"
-
C. Wang, J. Snyder, and J. R. Tucker, "Sub-40-nm PtSi Schottky source/drain metal-oxide-semiconductor-field-effect transistors," Appl. Phys. Lett., vol. 74, pp. 1174-1176, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 1174-1176
-
-
Wang, C.1
Snyder, J.2
Tucker, J.R.3
-
13
-
-
0033750787
-
"Simulation of Schottky barrier MOSFETs with a coupled quantum injection/Monte Carlo technique"
-
June
-
B. Winstead and U. Ravaioli, "Simulation of Schottky barrier MOSFETs with a coupled quantum injection/Monte Carlo technique," IEEE Trans. Electron Devices, vol. 47, pp. 1241-1246, June 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, pp. 1241-1246
-
-
Winstead, B.1
Ravaioli, U.2
-
14
-
-
0032672720
-
"35-nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate"
-
B
-
W. Saitoh, S. Yamagami, A. Itoh, and M. Asada, "35-nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate," Jpn. J. Appl. Phys., vol. 38, no. 6A/B, pp. 629-631, 1999.
-
(1999)
Jpn. J. Appl. Phys.
, vol.38
, Issue.6 A
, pp. 629-631
-
-
SaItoh, W.1
Yamagami, S.2
Itoh, A.3
Asada, M.4
-
15
-
-
0034317576
-
"A 20-nm gate-length ultra-thin body p-MOSFET with silicide source /drain"
-
J. Kedzierski, P. Xuan, V. Subramanian, J. Bokor, T. J. King, and C. Hu, "A 20-nm gate-length ultra-thin body p-MOSFET with silicide source/drain," Superlatt. Microstruct., vol. 28, no. 5/6, pp. 445-452, 2000.
-
(2000)
Superlatt. Microstruct.
, vol.28
, Issue.5-6
, pp. 445-452
-
-
Kedzierski, J.1
Xuan, P.2
Subramanian, V.3
Bokor, J.4
King, T.J.5
Hu, C.6
-
16
-
-
0036863371
-
"50-nm gate Schottky source/drain p-MOSFETs with a SiGe channel"
-
July
-
K. Ikeda, Y. Yamashita, A. Endoh, T. Fukano, K. Hikosaka, and T. Mimura, "50-nm gate Schottky source/drain p-MOSFETs with a SiGe channel," IEEE Electron Device Lett., vol. 23, pp. 670-672, July 2002.
-
(2002)
IEEE Electron Device Lett.
, vol.23
, pp. 670-672
-
-
Ikeda, K.1
Yamashita, Y.2
Endoh, A.3
Fukano, T.4
Hikosaka, K.5
Mimura, T.6
-
17
-
-
0002053947
-
"Three-Dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations"
-
H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase, and K. Kurihara, "Three-Dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 16, no. 1, pp. 69-76, 1998.
-
(1998)
J. Vac. Sci. Technol. B, Microelectron. Process. Phenom.
, vol.16
, Issue.1
, pp. 69-76
-
-
Namatsu, H.1
Takahashi, Y.2
Yamazaki, K.3
Yamaguchi, T.4
Nagase, M.5
Kurihara, K.6
-
18
-
-
0033906630
-
κ hydrogen silsesquioxane/copper interconnects employing deuterium plasma treatment"
-
κ hydrogen silsesquioxane /copper interconnects employing deuterium plasma treatment," J. Electrochem. Soc., vol. 147, no. 3, pp. 1186-1192, 2000.
-
(2000)
J. Electrochem. Soc.
, vol.147
, Issue.3
, pp. 1186-1192
-
-
Liu, P.T.1
Chang, T.C.2
Yang, Y.L.3
Cheng, Y.F.4
Lee, J.K.5
Shih, F.Y.6
Tsai, E.7
Chen, G.8
Sze, S.M.9
-
19
-
-
0033579765
-
2/Si(100) for ultrashort channel Schottky barrier metal-oxide-semiconductor field effect transistors"
-
2/Si(100) for ultrashort channel Schottky barrier metal-oxide-semiconductor field effect transistors," Appl. Phys. Lett., vol. 74, no. 3, pp. 454-456, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.74
, Issue.3
, pp. 454-456
-
-
Zhao, Q.T.1
Klinkhammer, F.2
Dolle, M.3
Kappius, L.4
Mantl, S.5
-
20
-
-
0346280181
-
"Formation of platinum-based silicide contacts: Kinetics, stoichiometry and current drive capabilities"
-
G. Larrieu, E. Dubois, X. Wallart, X. Baie, and J. Katcki, " Formation of platinum-based silicide contacts: Kinetics, stoichiometry and current drive capabilities," J. Appl. Phys., vol. 94, pp. 7801-7810, 2003.
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 7801-7810
-
-
Larrieu, G.1
Dubois, E.2
Wallart, X.3
Baie, X.4
Katcki, J.5
-
21
-
-
0036642907
-
"Low Schottky barrier source/drain for advanced MOS architecture: Device design and material considerations"
-
E. Dubois and G. Larrieu, "Low Schottky barrier source/drain for advanced MOS architecture: Device design and material considerations," Solid State Electron., vol. 46, pp. 997-1004, 2002.
-
(2002)
Solid State Electron.
, vol.46
, pp. 997-1004
-
-
Dubois, E.1
Larrieu, G.2
-
22
-
-
0035472007
-
x film"
-
Oct
-
x" IEEE Trans. Electron Devices, vol. 48, pp. 2363-2369, Oct. 2001.
-
(2001)
IEEE Trans. Electron. Devices
, vol.48
, pp. 2363-2369
-
-
Wakabayashi, H.1
Saito, Y.2
Takeuchi, K.3
Mogami, T.4
Kunio, T.5
-
23
-
-
0034272926
-
"An ultra-thin midgap gate FDSOI MOSFET"
-
H. Shang and M. H. White, "An ultra-thin midgap gate FDSOI MOSFET," Solid State Electron., vol. 44, no. 9, pp. 1621-1625, 2000.
-
(2000)
Solid State Electron.
, vol.44
, Issue.9
, pp. 1621-1625
-
-
Shang, H.1
White, M.H.2
-
24
-
-
0026908041
-
"Extended theoritical analysis of the steady-state linear behavior of accumulation-mode, long-channel p-MOSFETs on SOI substrates"
-
D. Flandre and A. Terao, "Extended theoritical analysis of the steady-state linear behavior of accumulation-mode, long-channel p-MOSFETs on SOI substrates," Solid State Electron., vol. 35, no. 8, pp. 1085-1092, 1992.
-
(1992)
Solid State Electron.
, vol.35
, Issue.8
, pp. 1085-1092
-
-
Flandre, D.1
Terao, A.2
-
25
-
-
0024770731
-
"Submicrometer near-intrinsic thin-film SOI complementary MOSFETs"
-
Nov
-
C. T. Lee and K. K. Young, "Submicrometer near-intrinsic thin-film SOI complementary MOSFETs," IEEE Trans. Electron Devices, vol. 36, pp. 2537-2547, Nov. 1989.
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, pp. 2537-2547
-
-
Lee, C.T.1
Young, K.K.2
|