Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2706-2710

  Goldberg, Kenneth A ^a   Naulleau, Patrick P ^a   Denham, Paul E ^a   Rekawa, Senajith B ^a   Jackson, Keith H ^a   Alexander Liddle, J ^a   Harteneck, Bruce ^a   Gullikson, Eric ^a   Anderson, Erik H ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGE ANALYSIS; MATHEMATICAL MODELS; MULTILAYERS; OPTICAL BEAM SPLITTERS; REFLECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY;

MICRO EXPOSURE TOOLS (MET); ULTRAVIOLET INTERFEROMETRY;

INTERFEROMETRY;

EID: 0942300070     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627809     Document Type: Conference Paper

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