100-picometer interferometry for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 316-328

  Sommargren, Gary E ^a   Phillion, Donald W ^a   Johnson, Michael A ^a   Nguyen, Nhan Q ^a   Barty, Anton ^a   Snell, Franklyn J ^a   Dillon, Daren R ^a   Bradsher, Lloyd S ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Aspheric mirrors; Extreme ultraviolet lithography; Interferometry

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; ELECTROMAGNETIC WAVE DIFFRACTION; INTERFEROMETRY; PHASE SHIFT; PHOTOLITHOGRAPHY;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

ULTRAVIOLET RADIATION;

EID: 0036378693     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472305     Document Type: Conference Paper

References (4)

1. G.E. Sommargren, "Phase shifting diffraction interferometry for measuring extreme ultraviolet optics," OSA Trends in Optics and Photonics Vol. 4, Extreme Ultraviolet Lithography, Glenn D. Kubiak and Don R. Kania, eds. (Optical Society of America, Washington, DC 1996), pp. 108-112.
2. Phase shifting can also be accomplished by axially translating the fiber or aspheric mirror, but the phase shift is non-uniform across the spherical wavefronts.
3. D.W. Phillion, "General methods for generating phase-shifting interferometry algorithms," Appl. Opt. 36, 8098-8115 (1997).
4. Sommargren, G.E., Phillion, D.W., Campbell, E.W., "Sub-nanometer interferometry for aspheric mirror fabrication," Precision Science and Technology for Perfect Surfaces, Y. Furukawa, Y. Moil and T. Kataoka, Editors, (Japan Society for Precision Engineering, Tokyo, 1999) pp. 329-335.