Tolerancing of diffraction–limited Kirkpatrick–Baez synchrotron beamline optics for extreme–ultraviolet metrology

Applied Optics

Volumn 40, Issue 22, 2001, Pages 3703-3709

  Naulleau, Patrick P ^a   Goldberg, Kenneth A ^a   Batson, Phillip J ^a   Jeong, Seongtae ^a   Underwood, James H ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; LIGHT SOURCES; LITHOGRAPHY; OPTICAL SYSTEMS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION; X RAY OPTICS;

SYNCHROTRON BEAMLINES;

DIFFRACTIVE OPTICS;

EID: 0011035555     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.003703     Document Type: Article

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