Linewidth variation characterization by spatial decomposition

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 2, 2002, Pages 106-116

  Wong, Alfred K ^a   Molless, Antoinette F ^b   Brunner, Timothy A ^b   Coker, Eric ^b   Fair, Robert H ^b   Mack, George L ^b   Mansfield, Scott M ^b  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

^b IBM RESEARCH   (United States)

Author keywords

ACLV; Characterization; Electrical linewidth measurement; Linewidth variation; Optical proximity correction; Photolithography

Indexed keywords

EID: 0141643085     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1488159     Document Type: Article

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