Linewidth uniformity error analysis for step-and-scan systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Zimmerman, John D ^a   Sumra, Javed ^a   Leong, Y K ^a   Govil, Pradeep ^a   Baxter, Greg ^a  

^a Silicon Valley Group Lithography Div   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; INTEGRATED CIRCUIT MANUFACTURE; STATISTICAL METHODS;

ANALYSIS OF VARIANCE (ANOVA) METHOD; LINE WIDTH ERRORS; STEP-AND-SCAN SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0033682547     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)