0.7 NA DUV Step & Scan system for 150 nm imaging with improved overlay

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 448-463

  van Schoot, Jan ^a   Bornebroek, Frank ^a   Suddendorf, Manfred ^a   Mulder, Melchior ^a   van der Spek, Jeroen ^a   Stoeten, Jan ^a   Hunter, Adolph ^a   Ruemmer, Peter ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; SIGNAL DISTORTION;

STEP AND SCAN SYSTEMS;

IMAGING SYSTEMS;

EID: 0032636569     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (13)