An ellipsometric study of W thin films deposited on Si

Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 216-219

  Deineka, A G ^a   Tarasenko, A A ^b   Jastrabik L ^a   Chvostova, D ^a   Bousek, J ^c  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Ukraine)

^c INSTITUTE OF SCIENTIFIC INSTRUMENTS   (Czech Republic)

Author keywords

Ellipsometry; Maxwell Garnett and Bruggeman effective medium approximations; Multilayer optical models; Optical constants; Thin tungsten films

Indexed keywords

ANGLE MEASUREMENT; APPROXIMATION THEORY; CONTACT ANGLE; ELLIPSOMETRY; FILM PREPARATION; MAGNETRON SPUTTERING; SILICA; SILICON; SUBSTRATES; SURFACE ROUGHNESS; TUNGSTEN; VOLUME FRACTION;

BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATION; MAXWELL-GARNETT EFFECTIVE MEDIUM APPROXIMATIONS; MULTILAYER OPTICAL MODELS;

METALLIC FILMS;

EID: 0033534948     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00977-8     Document Type: Article

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