An ellipsometric study of Ni, Mo and NixN films deposited on Si

Thin Solid Films

Volumn 313-314, Issue , 1998, Pages 314-318

  Tarasenko, A A ^a,b   Jastrabik L ^b   Chvostova, D ^b   Sobota, J ^c  

^a INSTITUTE OF PHYSICS   (Ukraine)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c INSTITUTE OF SCIENTIFIC INSTRUMENTS   (Czech Republic)

Author keywords

Ellipsometry; Molybdenum and nickel nitride films; Multilayer optical models; Optical constants; Thin nickel

Indexed keywords

ELLIPSOMETRY; MAGNETRON SPUTTERING; MOLYBDENUM; NICKEL; SEMICONDUCTING SILICON;

NICKEL NITRIDE FILMS;

METALLIC SUPERLATTICES;

EID: 0031998571     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00839-0     Document Type: Article

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