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Volumn 169-170, Issue , 2003, Pages 1-7

Microfabrication of electro- and electroless-deposition and its application in the electronic field

Author keywords

Electrodeposition; Electroless deposition; Highly functionalized thin film; Microfabrication

Indexed keywords

COBALT ALLOYS; ELECTROCHEMISTRY; MONOLAYERS; SILICA;

EID: 0037793264     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00037-9     Document Type: Article
Times cited : (29)

References (58)
  • 8
    • 0000928753 scopus 로고
    • New York: D.Van Nostrand Company, Inc
    • Bozorth R.M. Ferromagnetism, vol. V 1951 160 D.Van Nostrand Company, Inc New York
    • (1951) Ferromagnetism , vol.5 , pp. 160
    • Bozorth, R.M.1
  • 24
    • 0037508934 scopus 로고
    • Report of Research Institute for Scientific Measurements of Tohoku University
    • H. Kojima, C. Miyagawa, Report of Research Institute for Scientific Measurements of Tohoku University, 33 (1984) 1
    • (1984) , vol.33 , pp. 1
    • Kojima, H.1    Miyagawa, C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.