A soft magnetic CoNiFe film with high saturation magnetic flux density and low coercivity

Nature

Volumn 392, Issue 6678, 1998, Pages 796-798

  Osaka, Tetsuya ^a   Takai, Madoka ^a   Hayashi, Katsuyoshi ^a   Ohashi, Keishi ^b   Saito, Mikiko ^b   Yamada, Kazuhiko ^b  

^a WASEDA UNIVERSITY   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FERROMAGNETIC MATERIAL;

ARTICLE; ELECTROCHEMISTRY; ELECTROMAGNETIC FIELD; MAGNETIC FIELD; MAGNETISM; PRIORITY JOURNAL;

EID: 0032560161     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/33888     Document Type: Article

References (27)

1. Liao, S. H. High moment CoFe thin films by electrodeposition. IEEE Trans. Magn. MAG-23, 2981-2983 (1987).
2. Chang, J. W., Andricacos, P. C., Petek, B. & Romankiw, L. T. in Proc. Symp. on Magnetic Materials, Processes and Devices (eds Romankiw, L. T. & Herman, D. A. Jr) 361 -372 (PV90-8, Electrochem. Soc., Pennington, NJ, 1990).
3. Shinoura, O. & Kamijima, A. Magnetic properties of electrodeposited CoFe film. J. Surf. Finishing Soc. Jpn 44, 1114-1118 (1993).
4. Chang, J. W., Andricacos, P. C., Petek, B. & Romankiw, L. T. in Proc. 2nd Int. Symp. on Magnetic Materials, Processes, and Devices (eds Romankiw, L. T. & Herman, D. A. Jr) 275-287 (PV92-10, Electrochem. Soc., Pennington, NJ, 1992).
5. Anderson, N. C. & Chesnutt, R. B. Electrodeposition bath for cobalt-nickel-iron alloys for thin-film heads. US Patent no. 4,661, 216 (1987).
6. Omata, Y. Magnetic Properties of Fe-Co-Ni Films with High Saturation Magnetization Prepared by Evaporation and Electrodeposition 23-29 (Tech. Rep. MR-23, 23-29, (1988).
7. Shinoura, O., Kamijima, A. & Narumiya, Y. Soft magnetic properties of electrodeposited CoNiFe films. J. Magn. Soc. Jpn. 18, 277-280 (1994).
8. Yoshizawa, Y., Oguma, S, & Yamauchi, K. New Fe-based soft magnetic alloys composed of ultrafine grain structure. J. Appl. Phys. 64, 6044-6046 (1988).
9. Ishiwata, N., Wakabayashi, C. & Urai, H. Soft magnetism of high-nitrogen-concentration FeTaN films. J. Appl. Phys. 69, 5616-5618 (1991).
10. Hasegawa, N. & Saito, M. Soft magnetic properties of microcrystalline Fe-M-C (M=V, Nb, Ta) films with high thermal stabiity. J. Magn. Soc. Jpn 14,313-318 (1990).
11. Makino, A., Suzuki, K., Inoue, A. & Masumoto, T. Soft magnetic properties of bcc Fe-Zr-B sputtered films with nanoscale grain size. Mater. Trans. Jpn Inst. Metals 33, 80-86 (1992).
12. 2 plasma. J. Magn. Soc. Jpn 14, 283-288 (1990).
13. Wang, S. & Kryder, M. H. RF-diode-sputtered iron nitride films for thin-film recording head materials. J. Appl. Phys. 67, 5134-5136 (1990).
14. Ogura, T., Kume, M. & Kuroki, K. Soft magnetic properties and domain structure of Fe-N-O thin films for thin film head applciations. J. Magn. Soc. Jpn 18(S1), 195-198 (1994).
15. Wolf, I. W. Electrodeposition of magnetic materials. J. Appl. Phys. 33, 1152-1159 (1962).
16. Long, T. R. Electrodeposited memory element for a nondestructive memory. J. Appl. Phys. 31 (suppL), 123-124 (1960).
17. Romankiw, L. T. Electroformation of electronic devices. Plating Surf. Finish. 84, 10-16 (1997).
18. Smith, R. S., Godycki, L. E. & Lloyd, J. C. Effect of saccharin on the structural and magnetic properties of iron-nickel films. J. Electrochem. Soc. 108, 996-998 (1961).
19. Edwards, J. Radiotracer study of addition agent behaviour: 2-adsorption on metal surface from solutions containing thiourea. Tran. Inst. Met. Finish. 39, 45-51 (1962).
20. Edwards, J. Radiotracer study of addition agent behaviour: 3-incorporation of sulphur in nickel deposited from solutions containing p-toluenesulphonamide and saccharin. Tran. Inst. Met. Finish. 39,52-55 (1962).
21. Brown, H. Addition agents, anions, and inclusions in bright nickel plating. Plating 55, 1047-1055 (1968).
22. Nakamura, A., Takai, M., Hayashi, K. & Osaka, T. Preparation and magnetic properties of CoNiFe thin film by electrodeposition. J. Surf. Finish. Soc. Jpn 47, 934-938 (1996).
23. Takai, M., Hayashi, K., Aoyagi, M. & Osaka, T. Electrochemical preparation of soft magnetic CoNiFeS film with high saturation magnetic flux density and high resistivity. J. Electrochem. Soc. 144, L203-L204 (1997).
24. Ohashi, K. et al. Newly developed CoNiFe film for MR head. Paper no. DQ-09, presented at the 7th Joint MMM-Intermag Conf., San Francisco, January 1998.
25. Roundtable Discussion about the Future of Magnetic Storage, Session ZA-02, Presented at the 7th Joint MMM-Intermag Conf., San Francisco, January 1998.
26. Powers, J. V. & Romankiw, L. T, Electroplating Cell Including Means to Agitate the Electrolyte in Laminar Flow US Patent no. 4,652,442 (1972).
27. Calcagno, P. A. & Thompson, D. A. Semiautomatic permeance tester for thick magnetic films. Rev. Sci. Instrum. 46, 904-908 (1975).