Pulsed Electrodeposition of Nanocrystalline CoNiFe Soft Magnetic Thin Films

Journal of the Electrochemical Society

Volumn 148, Issue 9, 2001, Pages

  Nakanishi, Takuya ^a   Ozaki, Masaki ^a   Nam, Hyo Seung ^a   Yokoshima, Tokihiko ^a   Osaka, Tetsuya ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000125526     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1388886     Document Type: Article

References (29)

1. P. C. Andricacos and N. Robertson, IBM J. Res. Dev., 42, 671 (1998).
2. T. Osaka, M. Takai, K. Hayashi, K. Ohashi, M. Saito, and K. Yamada, Nature (London), 392, 796 (1998).
3. T. Osaka, M. Takai, K. Hayashi, Y. Sogawa, K. Ohashi, Y. Yasue, M. Saito, and K. Yamada, IEEE. Trans. Magn., 34, 1432 (1998).
4. K. Ohashi, Y. Yasue, M. Saito, K. Yamada, T. Osaka, M. Takai, and K. Hayashi, IEEE Trans. Magn., 34, 1462 (1998).
5. B. N. Popov, K.-M. Yin, and R. E. White, J. Electrochem. Soc., 140, 1321 (1993).
6. H. Schultz and M. Pritzker, J. Electrochem. Soc., 145, 2033 (1998).
7. D. L. Grimmett, M. Schwartz, and K. Nobe, J. Electrochem. Soc., 137, 3414 (1990).
8. D. L. Grimmett, M. Schwartz, and K. Nobe, J. Electrochem. Soc., 140, 973 (1993).
9. N. H. Phan, M. Schwartz, and K. Nobe, Electrochim. Acta, 39, 449 (1994).
10. H. Natter, T. Krajewski, and R. Hempelmann, Ber. Bunsen-Ges. Phys. Chem., 100, 55 (1996).
11. H. Natter and R. Hempelmann, J. Phys. Chem., 100, 19525 (1996).
12. H. Natter, M. Schmelzer, and R. Hempelmann, Mater. Res., 13, 1186 (1998).
13. H.-S. Nam, T. Yokoshima, T. Nakanishi, T. Osaka, Y. Yamazaki, and D. N. Lee, Thin Solid Films, 384, 288 (2001).
14. Y. Sogawa, S. Mizutani, T. Momma, T. Osaka, M. Saito, K. Ohashi, and K. Yamada, J. Magn. Soc., Jpn., 23, 1405 (1999).
15. A. Brenner, Electrodeposition of Alloys, Academic Press, New York (1963).
16. H. Dahms and I. M. Croll, J. Electrochem. Soc., 112, 771 (1965).
17. S. Hessami and C. W. Tobias, J. Electrochem. Soc., 136, 3611 (1989).
18. D. Gangasingh and J. B. Talbot, J. Electrochem. Soc., 138, 3605 (1991).
19. M. Matlosz, J. Electrochem. Soc., 140, 2272 (1993).
20. N. Zech, E. J. Podlaha, and D. Landolt, J. Electrochem. Soc., 146, 2892 (1999).
21. J. Horkans, J. Electrochem. Soc., 128, 45 (1981).
22. P. C. Andricacos, C. Arana, J. Tabib, J. Dukovic, and L. T. Romankiw, J. Electrochem. Soc., 136, 1336 (1989).
23. K. Y. Sasaki and J. B. Talbot, J. Electrochem. Soc., 142, 775 (1995).
24. N. H. Phan, M. Schwartz, and K. Nobe, J. Appl. Electrochem., 21, 672 (1991).
25. I. Tabakovic, S. Riemer, V. Inturi, P. Jallen, and A. Thayer, J. Electrochem. Soc., 147, 219 (2000).
26. X. Liu and G. Zangari, DB-05, p. 202, in Abstracts of the 8th Joint MMM-Intermag Conference, American Institute of Physics and the Magnetics Society of the IEEE, Jan 7-11, 2001.
27. H. Yamamoto, N. Ohshima, M. Saito, K. Ohashi, and H. Akai, Digests of the 24th Annual Conference on Magnetics in Japan, The Magnetics Society of Japan, p. 359, 14aE-8, Sept 12-15, 2000.
28. N. Ohshima, M. Saito, K. Ohashi, H. Yamamoto, K. Mibu, and T. Shinjo, Digests of the 24th Annual Conference on Magnetics in Japan, The Magnetic Society of Japan, p. 360, 14aE-9, Sept 12-15, (2000).
29. M. Saito, N. Ishiwata, and K. Ohashi, Abstract 621, The Electrochemical Society Meeting Abstracts. Vol. 2000-2, Phoenix, AZ, Oct 22-27, 2000.