Fabrication of large area nanostructured magnets by interferometric lithography

IEEE Transactions on Magnetics

Volumn 34, Issue 4 PART 1, 1998, Pages 1087-1089

  Farhoud, M ^a,b,c   Hwang, M ^a,b   Smith, Henry I ^b,c   Schattenburg, M L ^a,b,c   Bae, J M ^a,b   Youcef Toumi, K ^a,b,c   Ross, C A ^a,b,c  

^a Department of Electrical Engineering and Computer Science   (United States)

^b Department of Materials Science and Engineering ^*  (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Electrodeposition; Interferometric lithography; Nanomagnet; Patterned media

Indexed keywords

COBALT; ELECTRODEPOSITION; INTERFEROMETRY; LASER APPLICATIONS; MAGNETIC THIN FILMS; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY; ULTRAVIOLET DEVICES;

LARGE AREA NANOSTRUCTURED MAGNETS;

MAGNETIC FILM STORAGE;

EID: 0032119798     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.706365     Document Type: Article

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