Research and Development of High Performance Soft Magnetic Thin Films

Electrochemistry

Volumn 67, Issue 9, 1999, Pages 894-899

  Osaka, Tetsuya ^a   Momma, Toshiyuki ^a   Yokoshima, Tokihiko ^a  

^a NONE

Author keywords

Electrodeposition; High Bs Film; High Film; Soft Magnetic Film

Indexed keywords

EID: 0037846505     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.67.894     Document Type: Article

References (32)

1. S. H. Liao, IEEE Trans. Magn., MAG-23, 2981 (1987).
2. N. C. Anderson and R. B. Chesnutt (IBM), U. S. Patent, 4, 661, 216 (1987).
3. Y. Omata, S. Mitani, T. Taniguchi, and S. Nakagawa, J. Magn. Soc. Jpn, 14, 111 (1990) (in Japanese).
4. O. Shinoura, A. Kamijima, and Y. Narumiya, J. Magn. Soc. Jpn, 18, 277 (1994) (in Japanese).
5. N. Ishiwata, C. Wakabayashi, and H. Irai, J. Appl. Phys., 69, 5616 (1991).
6. M. Takahashi, H. Shoji, M. Abe, H. Komada, and T. Wakiyama, J. Magn. Soc. Jpn. 14, 283 (1990) (in Japanese).
7. R. S. Smith, L. E. Godycki, and J. C. Lloyd, J. Electrochem. Soc., 108, 996 (1961).
8. A. Nakamura, M. Takai, K. Hayashi, and T. Osaka, J. Surf. Finsh. Soc. Jpn., 47, 984 (1996) (in Japanese).
9. M. Takai, K. Hayashi, M. Aoyagi, and T. Osaka, J. Electrochem. Soc., 144, L203 (1997).
10. M. Takai, K. Hayashi, M. Aoyagi, and T. Osaka, J. Magn. Soc. Jpn., 21-S2, 443 (1997).
11. R. M. Bozorth, Ferromagnetism, D. Van Nostrand Company, Inc., New York, N.Y., p. 160 (1951).
12. T. Osaka, T. Sawaguchi, F. Mizutani, T. Yokoshima, M. Takai, and Y. Okinaka J. Electrochem. Soc., in press.
13. T. Osaka, M. Takai, K. Hayashi, K. Ohashi, M. Saito, and K. Yamada, Nature, 387, 796 (1998).
14. T. Osaka, M. Takai, K. Hayashi, Y. Sogawa, K. Ohashi, Y. Yasue, M. Saito, and K. Yamada, IEEE Trans. Magn., 34, 1632 (1998).
15. K. Ohashi, Y. Yasue, M. Saito, K. Yamada, T. Osaka, M. Takai, and K. Hayashi, IEEE Trans. Magn., 34, 1432 (1998).
16. T. Osaka, M. Takai, Y. Sogawa, T. Momma, K. Ohashi, M. Saito, and K. Yamada, J. Electrochem. Soc., 146, 2092 (1999).
17. Y. Sogawa, S. Mizutani, T. Momma, T. Osaka, M. Saito, K. Ohashi, and K. Yamada, J. Magn. Soc. Jpn., 23, 1405 (1999) (in Japanese).
18. M. Takai, F. Mera, A. Kondo, M. Kaseda, and T. Osaka, J. Surf. Finsh. Soc. Jpn, 49, 292 (1997) (in Japanese).
19. O. Shinoura, Denki Kagaku (presently Electrochemistry), 63, 473 (1995).
20. M. Takai, F. Mera, M. Kaseda, and T. Osaka, J. Magn. Soc. Jpn, 22, 629 (1997) (in Japanese).
21. T. Hatsukawa, T. Higashikawa, T. Osaka, and H. Nakao, J. Surf. Finsh. Soc. Jpn., 47, 779 (1996) (in Japanese).
22. A. Iizuka, T. Higashikawa, and T. Osaka, Proc. of the 3rd Intern. Symp. on Electrochemically Deposited Thin Films, Electrochem Soc., PV96-19, 184 (1996).
23. T. Yokoshima, M. Kaseda, M. Yamada, T. Nakanishi, T. Momma, and T. Osaka, IEEE Trans. Magn., in press.
24. K. Ohashi, N. Morita, T. Tsuda, and Y. Nonaka, Digests of Intermag '99, FB-04, Korea (1999).
25. M. Takai, K. Kageyama, S. Takefusa, A. Nakamura, and T. Osaka, IEICE Trans. Electron., E78-C, 1530 (1995).
26. T. Osaka, T. Homma, N. Masubuchi, K. Saito, M. Yoshino, Y. Yamazaki, and T. Namikawa, J. Mag. Soc. Jpn., 14, 309 (1990) (in Japanese).
27. T. Osaka, T. Homma, K. Kageyama, and Y. Matsunae, Denkt Kagaku (presently Electrochemistry), 62, 987 (1994).
28. T. Osaka, T. Homma, K. Kageyama, Y. Matsunae, and O. Shinoura, J. Mag. Soc. Jpn., 18-S1, 183 (1994).
29. M. Takai, S. Takefusa, T. Yokoshima, and T. Osaka, J. Surf. Finish. Soc. Jpn., 48, 98 (1997) (in Japanese).
30. M. Takai, S. Takefusa, T. Yokoshima, and T. Osaka, Proc, of Fundamantal Aspects of Electrochemical Deposition and Dissolution Including Modeling, Electrochem. Soc. PV97-27, 358 (1997).
31. T. Yokoshima, H. Yuasa, M. Kim, and T. Osaka, J. Surf. Finish. Soc. Jpn., 49, 1336 (1998).
32. T. Yokoshima, D. Kaneko, T. Osaka, S. Takefusa, and M. Osaki, J. Magn. Soc. Jpn., 23, 1397 (1999) (in Japanese).