Design, plasma studies, and ion assisted thin film growth in an unbalanced dual target magnetron sputtering system with a solenoid coil

Vacuum

Volumn 56, Issue 2, 2000, Pages 107-113

  Engstrom C ^a   Berlind, T ^a   Birch, J ^a   Hultman, L ^a   Ivanov, I P ^b   Kirkpatrick, S R ^c   Rohde, S ^c  

^a LINKÖPING UNIVERSITY   (Sweden)

^b CYPRESS SEMICONDUCTOR   (United States)

^c UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ION SOURCES; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA PROBES; PLASMA SOURCES; SOLENOIDS; SPUTTER DEPOSITION; THIN FILMS; VACUUM APPLICATIONS;

ION ASSISTED THIN FILM GROWTH;

FILM GROWTH;

EID: 0033908350     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00177-3     Document Type: Article

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