Formation of Ti/O compositional gradient film on Ti-6Al-4V alloy by reactive DC sputtering

Surface Science

Volumn 402-404, Issue , 1998, Pages 241-244

  Sonoda, T ^a   Kato, M ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Aluminum; Coatings; Sputter deposition; Surface structure, morphology, roughness, and topography; Titanium; Titanium oxide; Vanadium

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; FILM GROWTH; INTERFACES (MATERIALS); MORPHOLOGY; OXYGEN; SPUTTER DEPOSITION; STRESS CONCENTRATION; SURFACE ROUGHNESS; TITANIUM OXIDES; VANADIUM;

COMPOSITIONAL GRADIENT FILM; SURFACE TOPOGRAPHY;

TITANIUM ALLOYS;

EID: 0031632099     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00032-6     Document Type: Article

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