Large area deposition of amorphous and microcrystalline silicon by very high frequency plasma

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 541-546

  Sansonnens, L ^a   Howling, A A ^a   Hollenstein, Ch ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARRIER CONCENTRATION; DEPOSITION; DISSOCIATION; PLASMAS; SILANES;

MICROCRYSTALLINE SILICON; VERY-HIGH FREQUENCY (VHF) PLASMA DEPOSITION;

SEMICONDUCTING SILICON;

EID: 0032686796     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)