Large area deposition of hydrogenated amorphous silicon by VHF-PECVD using novel electrodes

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 900-903

  Ito, Norikazu ^a,b   Kondo, Michio ^b   Matsuda, Akihisa ^b  

^a Canon ANELVA Technix Corporation   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNA FEEDERS; DEPOSITION; DEPOSITION RATES; ELECTRIC DISCHARGES; LOOP ANTENNAS; SUBSTRATES;

CONTINUOUS MODE; DISCHARGE SOURCE; GLASS SUBSTRATES; LARGE-AREA DEPOSITION; NON-UNIFORMITIES; POWER FEEDING; PULSE MODES; VHF-PECVD;

AMORPHOUS SILICON;

EID: 84949543772     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.916029     Document Type: Conference Paper

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