Reactivity of the H-Si (111) surface

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 133, Issue 1-4, 1997, Pages 94-101

  Terry, Jeff ^a,c   Mo, Renee ^a   Wigren, Christer ^a,d   Cao, Renyu ^a   Mount, George ^a   Pianetta, Piero ^a   Linford, Matthew R ^b,e   Chidsey, Christopher E D ^b  

^a SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^b STANFORD UNIVERSITY   (United States)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

^d SWEDISH DEFENCE RESEARCH AGENCY   (Sweden)

^e MAX PLANCK INSTITUTE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; BINDING ENERGY; BROMINE; CHLORINE; MOLECULAR STRUCTURE; MONOLAYERS; OLEFINS; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SEMICONDUCTOR GROWTH; SURFACE TREATMENT;

HYDROGEN TERMINATED SILICON SURFACES; SURFACE FUNCTIONALIZATION;

SEMICONDUCTING SILICON;

EID: 0031550028     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00467-9     Document Type: Article

References (32)

1. G.S. Higashi, Y.J. Chabal, G.W. Trucks, K. Raghuachari, Appl. Phys. Lett. 56 (1990) 656.
2. P. Dumas, Y.J. Chabal, P. Jakob, Surf. Sci. 269/270 (1990) 867.
3. K. Hricovini, R. Gunther, P. Thiry, A. Taleb-Ibrahimi, G. Indlekofer, J.E. Bonnet, P. Dumas, Y. Petroff, X. Blase, X. Zhu, S.G. Louie, Y.J. Chabal, P.A. Thiry, Phys. Rev. Lett. 70 (13) (1993) 1992.
4. C.J. Karlsson, E. Landemark, L.S.O. Johansson, U.O. Karlsson, R.I.G. Uhrberg, Phys. Rev. B 41 (1990) 1521.
5. J. Terry, R. Cao, C. Wigren, P. Pianetta, J. Vacuum Sci. Tech. A 12 (1994) 1869.
6. J. Terry, C. Wigren, R. Cao, P. Pianetta, M.R. Linford, C.E.D. Chidsey (in preparation).
7. M.R. Linford, Chemical functionalization of hydrogen-terminated silicon surfaces: the first self-assembled monolayers on silicon, Doctoral Dissertation, Stanford University, 1996.
8. M.R. Linford, P. Fenter, P.M. Eisenberger, C.E.D. Chidsey, J. Amer. Chem. Soc. 117 (1995) 3145.
9. M.R. Linford, C.E.D. Chidsey, J. Amer. Chem. Soc. 115 (1993) 12631.
10. M.R. Linford, C.E.D. Chidsey (in preparation).
11. C.E.D. Chidsey, M.R. Linford, presented at the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 1995.
12. M.R. Linford, C.E.D. Chidsey (in preparation).
13. D.E. Eastman, F.J. Himpsel, J.F. van der Veen, J. Vacuum Sci. Tech. 20 (1982) 609.
14. L.J. Whitman, S.A. Joyce, J.A. Yarmoff, F.R. McFeely, L.J. Terminello, Surf. Sci. 232 (1990) 297.
15. V. Chakarian, D.K. Shuh, J.A. Yarmoff, M.C. Hakansson, U.O. Karlsson, Surf. Sci. 296 (1993) 383.
16. R.E. Thomas, R.A. Rudder, R.J. Markunas, Chemical Perspectives of Microelectronic Materials II Symposium 204 (1991) 327.
17. F.J. Himpsel, F.R. McFeely, A. Taleb-Ibrahimi, J.A. Yarmoff, G. Hollinger, Phys. Rev. B 38 (1988) 6084.
18. J. Terry, M.R. Linford, C. Wigren, R. Cao, P. Pianetta, C.E.D. Chidsey, Appl. Phys. Lett. 71 (1997) 1056.
19. A.W. Potts, D.G. Streets, J. Chem. Soc. Faraday Trans. II 70 (1974) 875.
20. J. Terry, C. Wigren, R. Cao, P. Pianetta, M.R. Linford, C.E.D. Chidsey (in preparation).
21. D.A. Lapiano-Smith, F.J. Himpsel, L.J. Terminello, J. Appl. Phys. 74 (1993) 5842.
22. S.M. Sze, Semiconductor Devices Physics and Technology, Wiley, New York, 1985.
23. R.J. Nemanich, C.R. Helms, M. Hirose, G.W. Rubloff, vol. 259, Materials Research Society, Pittsburg, 1992.
24. I. Langmuir, Trans. Faraday Soc. 15 (1920) 62.
25. K.B. Blodgett, J. Amer. Chem. Soc. 56 (1934) 495.
26. K.B. Blodgett, J. Amer. Chem. Soc. 57 (1935) 1007.
27. M.C. Petty, Langmuir-Blodgett Films An Introduction Cambridge University Press, Cambridge, 1996.
28. T. Schedel-Niedrig, M. Keil, H. Sotobayashi, T. Schilling, B. Tesche, A.M. Bradshaw, J. Phys: Condensed Matter 3 (A) (1991) S23.
29. D.A. Outka, J. Stohr, J.P. Rabe, J.D. Swalen, H.H. Rotermund, Phys. Rev. Lett. 59 (1987) 1321.
30. D.A. Outka, J. Stohr, J.P. Rabe, J.D. Swalen, J. Chem. Phys. 88 (1988) 4076.
31. U.J. Krull, R.S. Brown, A. Safarzadeh-Amiri, Proceedings of the SPIE - The International Society for Optical Engineering, vol. 906, 1988, p. 49.
32. G.L. Larkins, C.D. Fung, S.E. Rickert, Thin Solid Films 180 (1989) 217.