Second harmonie generation at chemically modified Si(111) surfaces

Journal of Physical Chemistry B

Volumn 104, Issue 32, 2000, Pages 7668-7676

  Mitchell, S A ^a   Boukherroub, R ^a   Anderson, S ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; MONOLAYERS; PHOTOCHEMICAL REACTIONS; SECOND HARMONIC GENERATION; SURFACES;

ELECTRIC DIPOLE APPROXIMATION; LIQUID IMMERSION CELL; WET CHEMICAL ETCHING;

SILICON;

EID: 0034246095     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp000450d     Document Type: Article

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