Chemical vapor deposition of organic monolayers on Si(100) via Si-N linkages

Langmuir

Volumn 15, Issue 23, 1999, Pages 8147-8154

  Zhu, X Y ^a   Mulder, J A ^a   Bergerson, W F ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; CHEMICAL VAPOR DEPOSITION; DESORPTION; DISSOCIATION; HYDROCARBONS; MOLECULAR STRUCTURE; NITROGEN; SEMICONDUCTING SILICON; SURFACES; TEMPERATURE; THERMODYNAMIC STABILITY; THIN FILMS;

CYCLOADDITION REACTION; GRIGNARD REAGENT; SELF ASSEMBLED MONOLAYER;

MONOLAYERS;

EID: 0033331215     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la990728x     Document Type: Article

References (32)

1. Ulman, A. Chem. Rev. 1996, 96, 1533.
2. Poirier, G. E. Chem. Rev. 1997, 97, 1117.
3. Whitesides, G. M.; Xia, Y. Annu. Rev. Mater. Sci. 1998, 28, 153.
4. Sagiv, J. J. Am. Chem. Soc. 1980, 102, 92.
5. Wasserman, S. R.; Tao, Y.-T.; Whitesides, G. M. Langmuir 1989, 5, 1074.
6. Brzoska, J. B.; Azouz, I. B.; Rondelez, F. Langmuir 1994, 10, 4367.
7. Parikh, A. N.; Allara, D. L.; Azouz, I. B.; Rondelez, F. J. Phys. Chem. 1994, 98, 7577.
8. Stevens, M. J. Langmuir 1999, 15, 2773.
9. Lindford, M. R.; Fenter, P.; Eisenberger, P. M.; Chidsey, C. E. D. J. Am. Chem. Soc. 1995, 117, 3145.
10. Sieval, A. B.; Demiral, A. L.; Nissink, J. W. M.; Linford, M. R; Van der Maas, J. H.; De Jeu, W. H.; Zuilhof, H.; Sudholter, E. J. Langmuir 1998, 14, 1759.
11. Bansal, A.; Li, X.; Lauermann, I.; Lewis, N. S.; Yi, S. I.; Weinberg, W. H. J. Am. Chem. Soc. 1996, 118, 7725.
12. Hamers, R. J.; Hovis, J. S.; Lee, S.; Liu, H.-B.; Shan, J. J. Phys. Chem. B 1997, 101, 1489.
13. Konecny, R.; Doren, D. J. J. Am. Chem. Soc. 1997, 119, 11098.
14. Teplyakov, A. V.; Kong, M. J.; Bent, S. F. J. Am. Chem. Soc. 1997, 119, 11100.
15. Effenberger, F.; Gotz, G.; Bidlingmaier, B.; Wezstein, M. Angew. Chem., Int. Ed. Engl. 1998, 37, 2462.
16. Cleland, G.; Horrocks, B. R.; Houlton, A. J. Chem. Soc., Faraday Trans. 1995, 91 (21), 4001.
17. Sailor, M. J.; Lee, E. J. Adv. Mater. 1997, 9, 783.
18. Buriak, J. M.; Allen, M. J. J. Am. Chem. Soc. 1998, 120, 1339.
19. Song, J. H.; Sailor, M. J. J. Am. Chem. Soc. 1998, 120, 2376.
20. Kim, N. Y.; Laibinis, P. E. J. Am. Chem. Soc. 1998, 120, 4516.
21. Mulder, J. A.; Hsung, R. P.; Zhu, X.-Y. J. Am. Chem. Soc. Submitted for publication.
22. Bergerson, W. F.; Mulder, J. A.; Hsung, R. P.; Zhu, X.-Y. J. Am. Chem. Soc. 1999, 121, 454.
23. Kugler, Th.; Thibaut, U.; Abraham, M.; Folkers, G.; Gopel, W. Surf. Sci. 1992, 260, 64.
24. Bitzer, T.; Alkunshalie, T.; Richardson, N. V. Surf. Sci. 1996, 368, 202.
25. Rummel, R.-M.; Ziegler, C. Surf. Sci. 1998, 418, 303.
26. Ellison, M. D.; Hovis, J. S.; Liu, H.; Hamers, R. J. J. Phys. Chem. B 1998, 102, 8510.
27. Waltenburg, H. N.; Yates, J. T., Jr. Chem. Rev. 1995, 95, 1589.
28. Moulder, J. F.; Stickle, W. F.; Sobol, P. E.; Bomben, K. D. Handbook of X-day Photoelectron Spectroscopy; Chastain, J., King, R. C., Jr., Eds.; Physical Electronics, Inc.: Eden Prairie, MN, 1995.
29. Ranke, W.; Jacobi, K. Surf. Sci. 1977, 63, 33.
30. Somorjai, G. A. Introduction to Surface Chemistry and Catalysis; John Wiley & Sons: New York, 1994; p 383.
31. Sung, M. M.; Kluth, G. J.; Yauw, O. W.; Maboudian, R. Langmuir 1997, 13, 6164.
32. Kluth, G. J.; Sung, M. M.; Maboudian, R. Langmuir 1997, 13, 3775.