Reactions of water and methanol at hydrogen-terminated silicon surfaces studied by transmission FTIR

Journal of the Chemical Society - Faraday Transactions

Volumn 93, Issue 14, 1997, Pages 2427-2431

  Bateman, James E ^a   Horrocks, Benjamin R ^a   Houlton, Andrew ^a  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33748627964     PISSN: 09565000     EISSN: None     Source Type: Journal    
DOI: 10.1039/a701286a     Document Type: Article

References (32)

1. S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era, Lattice Press, Sunset Beach, 1986.
2. M. R. Linford and C. E. D. Chidsey, J. Am. Chem. Soc., 1993, 115, 12631;
3. M. R. Linford, P. Fenter, P. M. Eisenberger and C. E. D. Chidsey, J. Am. Chem. Soc., 1995, 117, 3145.
4. E. J. Lee, T. W. Bitner, J. S. Ha, M. J. Shane and M. J. Sailor, J. Am. Chem. Soc., 1996, 118, 5375.
5. E. J. Lee, J. S. Ha and M. J. Sailor, J. Am. Chem. Soc., 1995, 117, 8295.
6. A. Bansal, X. Li, I. Lauermann, N. S. Lewis, S. I. Yi and W. H. Weinberg, J. Am. Chem. Soc., 1996, 118, 7225.
7. G. Clelland, B. R. Horrocks and A. Houlton, J. Chem. Soc., Faraday Trans., 1995, 91, 4001.
8. V. A. Burrows, Y. J. Chabal, G. S. Higashi, K. Raghavachari and S. B. Christman, Appl. Phys. Lett., 1988, 53, 998.
9. P. Dumas and Y. J. Chabal, Chetn. Phys. Lett., 1991, 181, 537.
10. P. Dumas, Y. J. Chabal and P. Jakob, Surf. Sci., 1992, 269/270, 867.
11. E. P. Boonekamp, J. J. Kelly, J. van de Ven and A. H. M. Sondag, J. Appl. Phys., 1994, 75, 8121.
12. H. Ogawa, K. Ishikawa, C. Inomata and S. Fujimura, J. Appl. Phys., 1996, 79, 472.
13. J. Rappich and H. J. Lewerenz, Electrochim. Acta, 1996, 41, 675.
14. M. Nakamura, M-B. Song and M. Ito, Electrochim. Acta, 1996, 41, 681.
15. J. A. Glass Jr., E. A. Wovchko and J. T. Yates Jr., Surf. Sci., 1995, 338, 125.
16. M. Warntjes, C. Vieillard, F. Ozanam and J-N. Chazalviel, J. Electrochem. Soc., 1995, 142, 4138.
17. J-N. Chazalviel, J. Electroanal. Chem., 1987, 233, 37.
18. I. W. Boyd and J. I. B. Wilson, J. Appl. Phys., 1982, 53, 4166.
19. J. S. Wong and Y-S. Yen, Appl. Spectrosc., 1988, 42, 598.
20. M. A. Chesters, A. B. Horn, E. J. C. Kellar, S. F. Parker and R. Raval, in Mechanisms of Reaction of Organometallic Compounds with Surfaces, ed. D. J. Cole-Hamilton and J. O. Williams, ASI Series, Ser. B, Physics, Plenum, New York, 1989, vol. 198;
21. H. Hoffmann, U. Mayer and A. Krischanitz, Langmuir, 1995, 11, 1304.
22. H. Ogawa and T. Hattori, Appl. Phys. Lett., 1992, 61, 577.
23. F. Ozanam and J-N. Chazalviel, J. Electroanal. Chem., 1989, 269, 251.
24. D. W. Berreman, Phys. Rev., 1963, 130, 2193.
25. H. Shirai, Jpn. J. Appl. Phys., 1994, 33, L94.
26. R. C. Anderson, R. S. Muller and C. W. Tobias, J. Electrochem. Soc., 1993, 140, 1393.
27. G. S. Higashi, Y. J. Chabal, G. W. Trucks and K. Raghavachari, Appl. Phys. Lett., 1990, 56, 656.
28. J. A. Schaefer, D. Frankel, F. Stucki, W. Göpel and G. J. Lapeyre, Surf. Sci., 1984, 139, L209.
29. J. M. Rehm, G. L. McLendon, L. Tsybeskov and P. M. Fauchet, Appl. Phys. Lett., 1995, 66, 3669.
30. M. A. Hory, R. Hérino, M. Ligeon, F. Muller, F. Gaspard, I. Mihalcescu and J. C. Vial, Thin Solid Films, 1995, 255, 200.
31. K. Mizuno and M. Saeki, Bunseki Kagaku, 1991, 40, 685 (in Japanese).
32. E. Lukevics and M. Dzintara, J. Organomet. Chem., 1985, 295, 265.