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Plasma Sources Science and Technology

Volumn 11, Issue 3 A, 2002, Pages

Production and control of planar microwave plasmas for materials processing

(2) Ganachev, Ivan P a Sugai, Hideo b

a Shibaura Mechatronics Corporation (Japan)

b NAGOYA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EIGENVALUES AND EIGENFUNCTIONS; MATHEMATICAL MODELS; MICROWAVES; PLASMA DENSITY; PLASMA HEATING; PLASMAS; RESONANCE; STABILITY;

ENERGY BALANCE STABILITY; HIGH DENSITY SURFACE WAVE PLASMAS; MATERIALS PROCESSING; MODE JUMPS; MULTIVALUED POWER DENSITY DEPENDENCE; NONMAGNETIZED LARGE AREA PLANAR MICROWAVE PLASMA SOURCES; PLANAR MICROWAVE PLASMAS; RESONANCE DENSITIES; STANDING WAVE EIGENMODE;

PLASMA DEVICES;

EID: 0036671192 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/11/3A/327 Document Type: Conference Paper

Times cited : (38)

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