Concentric spread plasma source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 10, 1998, Pages 5751-5756

  Watanabe, Seiichi ^a   Sumiya, Masahiro ^a   Kawasaki, Sunao ^b  

^a HITACHI LTD   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

Ashing; Etching; Microwave; Plasma; Semiconductor; Surface wave; Wave guide

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CURRENTS; MICROWAVE HEATING; PLASMA ETCHING; PLASMA STABILITY; QUARTZ; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE WAVES; WAVEGUIDES;

ASHING; COAXIAL WAVEGUIDES; CONCENTRIC SPREAD PLASMAS (CSP);

PLASMA SOURCES;

EID: 0032179355     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5751     Document Type: Article

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