Local resonant excitation of plasma oscillations in a planar surface-wave plasma device

Plasma Sources Science and Technology

Volumn 8, Issue 3, 1999, Pages 363-369

  Ghanashev, I ^a   Sugai, H ^a   Morita, S ^a   Toyoda, N ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b Nissin Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DAMPING; ELECTRIC FIELDS; MICROWAVE MEASUREMENT; PERMITTIVITY; PLASMA DENSITY; PLASMA DEVICES; PLASMA SOURCES; PLASMA WAVES; RESONANCE;

ELECTRON PLASMA FREQUENCY; LANDAU DAMPING; PLASMA PERMITTIVITY; RESONANCE LAYER; SPACE RESOLVED MICROWAVE INTENSITY MEASUREMENTS; SURFACE WAVE PLASMA DEVICE;

PLASMA OSCILLATIONS;

EID: 0032683801     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/3/304     Document Type: Article

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