Optical emission and microwave field intensity measurements in surface wave-excited planar plasma

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 3 A, 1996, Pages

  Nagatsu, Masaaki ^a   Xu, Ge ^a   Yamage, Masashi ^b   Kanoh, Masaaki ^b   Sugai, Hideo ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Cutoff density; High density plasma; Large diameter plasma; Microwave field intensity; Microwave plasma; Mode structure; Optical emission; Slot antenna; Surface wave

Indexed keywords

LIGHT EMISSION; PLASMA DENSITY; PRESSURE EFFECTS; SLOT ANTENNAS; SURFACE WAVES;

CUTOFF DENSITY; MICROWAVE FIELD INTENSITY MEASUREMENTS; MICROWAVE PLASMAS; MODE STRUCTURE; PLANAR PLASMAS; SURFACE WAVE EXCITED PLANAR PLASMAS;

PLASMAS;

EID: 0030107435     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l341     Document Type: Article

References (17)

1. A. W. Trivelpiece and R. W. Gould: J. Appl. Phys. 30 (1959) 1784.
2. M. Moisan, C. Beaudry and P. Leprince: IEEE Trans. Plasma Sci. PS-3 (1975) 55.
3. J. Margot-Chaker, M. Moissan, M. Chaker, V. M. M. Claude, P. Lauque, J. Paraszczak and G. Sauve: J. Appl. Phys. 66 (1989) 4134.
4. M. Moisan and Z. Zakrzewski: J. Phys. D 24 (1991) 1025.
5. A. Shivarova and I. Zhelyazkov: Electromagnetic Surface Modes, ed. A. D. Boardman (John Wiley & Sons Ltd., 1982) Chap. 12, p. 465.
6. M. Moisan and Z. Zakrzewski: Microwave Excited Plasmas, eds. M. Moisan and J. Pelletier (Elsevier, Amsterdam, 1992) p. 123.
7. S. Fujimura, K. Shinagawa, M. Suzuki and M. Nakamura: J. Vac. Sci. & Technol. B 9 (1991) 357.
8. K. Komachi and S. Kobayashi: J. Microwave Power & Electromagnetic Energy 24 (1989) 140.
9. K. Komachi and S. Kobayashi: J. Microwave Power & Electromagnetic Energy 25 (1990) 236.
10. T. Akimoto, E. Ikawa, T. Sango, K. Komachi, K. Katayama and T. Ebata: Jpn. J. Appl. Phys. 33 (1994) 7037.
11. E. A. Wolff: Antenna Analysis (John Wiley & Sons Inc., NewYork, 1966) Chap. 5, p. 139.
12. F. Werner, D. Korzec and J. Engelmann: Plasma Sources Sci. Technol. 3 (1994) 473.
13. E. Bluem, S. Bechu, C. Boisse-Laporte, P. Leprince and J. Marec: J. Phys. D 28 (1995) 1529.
14. H. Tamura, T. Otsubo, I. Sasaki, K. Ohara, Y. Yamaguchi and S. Kato: Proc. 41st National Symp. Amer. Vac. Soc. (Amer. Vac. Soc., Denver, 1994) p. 191.
15. G. Sauve, M. Moisan and Z. Zakrewski: J. Microwave Power & Electromagnetic Energy 28 (1993) 123.
16. A. F. Stevenson: J. Appl. Phys. 19 (1948) 24.
17. R. L. Stenzel, A. Y. Wong and H. C. Kim: Phys. Rev. Lett. 32 (1974) 654.