Generation of a surface-wave-enhanced plasma using coaxial-type open-ended dielectric cavity

Japanese Journal of Applied Physics

Volumn 34, Issue 8, 1995, Pages L1076-L1078

  Kimura, Tadashi ^a   Yoshida, Yoshikazu ^a,b   Mizuguchi, Shin Ichi ^a  

^a PANASONIC CORPORATION   (Japan)

^b UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

Coaxial type open ended dielectric cavity; Large area plasma; Microwave plasma; Photoresist ashing; Surface wave enhanced plasma

Indexed keywords

MICROWAVES; OXYGEN; PHOTORESISTS; PLASMA DENSITY; PRESSURE MEASUREMENT; SUBSTRATES; SURFACE WAVES; WAVEGUIDES;

COAXIAL WAVEGUIDE; DIELECTRIC CAVITY; MICROWAVE PLASMA; MICROWAVE PROPAGATION; PHOTORESIST ASHING;

PLASMA SOURCES;

EID: 0029356961     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.34.L1076     Document Type: Article

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