Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 9 A, 1999, Pages 5256-5261

  Kokura, Hikaru ^a   Yoneda, Shinichi ^b   Nakamura, Keiji ^c   Mitsuhira, Noriyuki ^a   Nakamura, Moritaka ^b   Sugai, Hideo ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

^c Siminiiomo Meial Industries Co Lid   (Japan)

Author keywords

Fluorocarbon plasma; High energy electron; Inductively coupled plasma; Ionic composition; Radical composition; Surface wave plasma

Indexed keywords

ARGON; ELECTRONS; EMISSION SPECTROSCOPY; FLUOROCARBONS; GAS DISCHARGE TUBES; IONS; OXIDES; PLASMA DENSITY; PLASMA SOURCES; SURFACE WAVES; WAVEGUIDES;

ELECTRON ENERGY DISTRIBUTION FUNCTION; INDUCTIVELY COUPLED PLASMAS (ICP); SURFACE WAVE PLASMAS;

PLASMA ETCHING;

EID: 0033309516     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.5256     Document Type: Article

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