Production of large-diameter uniform plasma in mTorr range using microwave discharge

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4309-4312

  Yasaka, Yasuyoshi ^a   Nozaki, Daiki ^a   Koga, Kazuya ^a   Ando, Makoto ^b   Yamamoto, Tetsuya ^b   Goto, Naohisa ^c   Ishii, Nobuo ^d   Morimoto, Tamotsu ^d  

^a KYOTO UNIVERSITY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c TAKUSHOKU UNIVERSITY   (Japan)

^d TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTROMAGNETIC WAVE PROPAGATION IN PLASMA; MICROWAVE MEASUREMENT; PLASMA DENSITY; PLASMA SOURCES; PRESSURE; SLOT ANTENNAS;

ION SATURATION CURRENT; LANGMUIR PROBES; MICROWAVE DISCHARGE; MICROWAVE FIELD PROPAGATION; MICROWAVE POWER; MULTISLOTTED PLANAR ANTENNA; OVERDENSE PLASMA;

SEMICONDUCTOR PLASMAS;

EID: 0033157536     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4309     Document Type: Article

References (5)

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2. N. Shida, T. Inoue, H. Kokai, Y. Sakamoto, W. Miyasawa, S. Den and Y. Hayashi: Jpn. J. Appl. Phys. 32 (1993) L1635.
3. Y. Yasaka and T. Nakamura: Appl. Phys. Lett. 68 (1996) 1476.
4. M. Takahashi, J. Takada, M. Ando and N. Goto: IEE Proc. 137 (1990) 249.
5. V. Ginzburg: The Propagation of Electromagnetic Waves in Plasmas (Pergamon Press, London, 1964).