Large-diameter microwave plasma source excited by azimuthally symmetric surface waves

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 3, 2000, Pages 840-848

  Tuda, Mutumi ^a   Ono, Kouichi ^a,b   Ootera, Hiroki ^a   Tsuchihashi, Masaaki ^a   Hanazaki, Minoru ^a   Komemura, Toshio ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DRY ETCHING; ELECTRON CYCLOTRON RESONANCE; FLUOROCARBONS; LIGHT EMISSION; MAGNETIC FIELD EFFECTS; MICROWAVES; PLASMA ETCHING; PLASMA PROBES; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; SURFACE WAVES;

MICROWAVE PLASMA SOURCES; PLASMA REACTORS;

PLASMA SOURCES;

EID: 0034187421     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582265     Document Type: Article

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