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Volumn 38, Issue 8 B, 1999, Pages 4905-4909

Oxygen microwave plasma density enhancement by surface waves with a high-permittivity material window

Author keywords

High density plasma; Large diameter plasma; Oxygen plasma for ULSI processes; Permittivity of the dielectric window; Surface wave plasma

Indexed keywords

ALUMINA; CARRIER CONCENTRATION; DIELECTRIC MATERIALS; MAGNETIC FIELD MEASUREMENT; MICROWAVES; OXYGEN; PERMITTIVITY; PRESSURE MEASUREMENT; QUARTZ APPLICATIONS; SURFACE WAVES; TEMPERATURE MEASUREMENT; ULSI CIRCUITS;

EID: 0033173972     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4905     Document Type: Article
Times cited : (7)

References (4)
  • 3
    • 0007633874 scopus 로고
    • eds. C. M. Ferreira and M. Moisan Plenum Press, New York
    • Z. Zakrezewski and M. Moisan: Microwave Discharges, eds. C. M. Ferreira and M. Moisan (Plenum Press, New York, 1993) p. 117.
    • (1993) Microwave Discharges , pp. 117
    • Zakrezewski, Z.1    Moisan, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.