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Volumn 40, Issue 2 A, 2001, Pages 819-823
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Mechanism of the production of concentric spread plasma
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Author keywords
Ashing; Etching; Microwave; Plasma; Semiconductor; Surface wave
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Indexed keywords
COMPUTER SIMULATION;
ELECTRIC FIELD EFFECTS;
FINITE ELEMENT METHOD;
MICROWAVES;
PRESSURE;
SURFACE WAVES;
CONCENTRIC SPREAD PLASMA;
JOULE HEATING;
MICROWAVE POWER;
SURFACE WAVE EXCITED PLASMA;
THREE DIMENSIONAL ELECTROMAGNETIC WAVE SIMULATION;
TRANSVERSE ELECTRIC MAGNETIC MODE MICROWAVE;
TRANSVERSE ELECTRIC MODE MICROWAVE;
PLASMAS;
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EID: 0035246291
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.40.819 Document Type: Article |
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Times cited : (1)
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References (17)
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