High-precision reflectometry of multilayer coatings for Extreme Ultraviolet Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 83-93

  Wedowski, Marco ^a   Underwood, James H ^a   Gullikson, Eric M ^a   Bajt, Sasa ^a   Folta, James A ^a   Kearney, Patrick A ^a   Montcalm, Claude ^a   Spiller, Eberhard ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MASKS; OPTICAL COATINGS; OPTICAL MULTILAYERS; OPTICAL RESOLVING POWER; PRECISION ENGINEERING; PROJECTION SYSTEMS; REFLECTIVE COATINGS; REFLECTOMETERS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033683867     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)