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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 133-148

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography

(2) Mirkarimi, P B a Montcalm, C a

a LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; DEFORMATION; LIGHT REFLECTION; MULTILAYERS; OPTICAL COATINGS; PROJECTION SYSTEMS; STRESS ANALYSIS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0032401527 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.309565 Document Type: Conference Paper

Times cited : (37)

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