Beamline for measurement and characterization of multilayer optics for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 52-61

  Underwood, J H ^a   Gullikson, E M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Calibration; EUV; Extreme ultraviolet; Monochromators; Reflectometry; Standards

Indexed keywords

CALIBRATION; MONOCHROMATORS; OPTICAL COATINGS; OPTICAL MULTILAYERS; SCATTERING; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

LITHOGRAPHY;

EID: 0032402403     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309608     Document Type: Conference Paper

References (10)

1. Multilayer facilities required for extreme ultraviolet lithography
2. Reflecting multilayer coatings for EUV projection lithography
3. The elusive diffraction limit
4. Varied-space grazing incidence gratings in high resolution scanning spectrometers
5. A new optical design method and its application to an extreme ultraviolet varied line spacing plane grating monochromator
6. Experimental comparison of mechanically ruled and holographically recorded gratings for a varied-line-spacing plane-grating monochromator
7. Generation of a parallel x-ray beam and its use for testing collimators
8. Non-specular scattering from multilayer mirrors at normal incidence