Minimum critical defects in extreme-ultraviolet lithography masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2467-2470

  Lin, Yun ^a   Bokor, Jeffrey ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001184857     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589668     Document Type: Article

References (10)

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