Dry etching of Ta absorber for EUVL masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 749-755

  Hoshino, E ^a   Ogawa, T ^a   Hirano, N ^a   Hoko, H ^a   Takahashi, M ^a   Yamanashi, H ^a   Chiba, A ^a   Ito, M ^a   Okazaki, S ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

ECR; Etching; EUVL; Mask; Ta

Indexed keywords

DRY ETCHING; ELECTRON CYCLOTRON RESONANCE; MASKS; PATTERN MATCHING; SILICON WAFERS; SUBSTRATES; TANTALUM DEPOSITS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) MASKS;

PHOTOLITHOGRAPHY;

EID: 0035043227     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410755     Document Type: Conference Paper

References (2)