Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2935-2938

  Lee, Sang Hun ^a,b   Bokor, Jeffrey ^a,b   Naulleau, Patrick ^a,b   Jeong, Seong Tae ^a,b   Goldberg, Kenneth A ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; INTERFEROMETERS; MASKS; MICROSCOPIC EXAMINATION; MULTILAYERS; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET HOLOGRAPHIC MICROSCOPY;

HOLOGRAPHY;

EID: 0034314695     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1314382     Document Type: Article

References (7)

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3. S. Lee, P. Naulleau, K. Goldberg, C. Cho, and J. Bokor (unpublished).
4. S. Burkhart, C. Cerjan, P. Kearney, P. Mirkarimi, C. Walton, and A. Ray-Chaudhuri, Proc. SPIE 3676, 570 (1999).
5. S. Jeong et al., J. Vac. Sci. Technol. B 17, 3009 (1999).
6. J. Goodman, Introduction to Fourier Optics, 2nd ed. (McGraw-Hill, New York, 1996).
7. K. A. Goldberg, P. Naulleau, and J. Bokor, J. Vac. Sci. Technol. B 17, 2982 (1999).