EUVL printing results of a Low Thermal Expansion Material (LTEM) mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 855-860

  Tong, William M ^a   Taylor, John S ^a   Hector, Scott D ^a   Shell, Melissa M ^a   Zhang, Guojing ^a   Kearney, Patrick A ^a   Walton, Christopher C ^a   Larson, Cindy ^a   Wasson, James R ^a   Mangat, Pawitter ^a   O'Connell, Donna J ^a   Folk, Daniel R ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; ERROR CORRECTION; FINITE ELEMENT METHOD; MASKS; MATHEMATICAL MODELS; METALLIC SUPERLATTICES; MOLYBDENUM; PRINTING; SILICON; SILICON WAFERS; THERMAL EXPANSION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); LOW THERMAL EXPANSION MATERIALS (LTEM); PHOTOMASKS; THERMAL DISTORTION; THERMAL EXPANSION COEFFICIENT;

PHOTOLITHOGRAPHY;

EID: 0033712178     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)