Recent advances in the Sandia EUV 10x microstepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 11-19

  Goldsmith, John E M ^a   Barr, Pamela K ^a   Berger, Kurt W ^a   Bernardez II, Luis J ^a   Cardinale, Gregory F ^a   Darnold, Joel R ^a   Folk, Daniel R ^a   Haney, Steven J ^a   Henderson, Craig C ^a   Jefferson, Karen L ^a   Krenz, Kevin D ^a   Kubiak, Glenn D ^a   Nissen, Rodney P ^a   O'Connell, Donna J ^a   Perras, Yon E ^a   Ray Chaudhuri, Avijit K ^a   Smith, Tony G ^a   Stulen, Richard H ^a   Tichenor, Daniel A ^a   Ver Berkmoes, Alfred A ^a   Wronosky, John B ^a   more..

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

EUV; Extreme ultraviolet; Lithography; Microlithography; Microstepper; Stepper

Indexed keywords

BANDWIDTH; COMPUTER SOFTWARE; GRAPHICAL USER INTERFACES; LASER PRODUCED PLASMAS; LITHOGRAPHY; ULTRAVIOLET DEVICES;

MICROSTEPPER SYSTEMS;

IMAGING SYSTEMS;

EID: 18544383957     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309570     Document Type: Conference Paper

References (21)

1. Diffraction-limited soft x-ray projection lithography with a laser plasma source
2. Development and characterization of a 10x Schwarzschild system for soft-x-ray projection lithography
3. Fabrication of MOS devices with extreme ultraviolet lithography
4. Fabrication of metal-oxide-semiconductor devices with extreme ultraviolet lithography
5. Recent results in the development of an integrated EUVL laboratory tool
6. Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool
7. Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool
8. Debris-free EUVL sources based on gas jets
9. High-power extreme ultraviolet source based on gas jets
10. At-wavelength interferometry for extreme ultraviolet lithography
11. Multilayer reflective coatings for extreme-ultraviolet lithography
12. Multilayer coating and tests of a 10x extreme ultraviolet lithographic camera
13. Beamline for measurement and characterization of multilayer optics for EUV lithography, this volume
14. Phase shifting diffraction interferometry for measuring extreme ultraviolet optics
15. Fabrication and testing of optics for EUV projection lithography
16. Characterization of the accuracy of EUV point diffraction interferometry
17. Nonspecular scattering for normal incidence EUV optics
18. Top surface imaging resists for EUV lithography
19. Printability of substrate and absorber defects on extreme ultraviolet lithographic masks
20. Printability of substrate and absorber defects on extreme ultraviolet lithographic masks
21. EUV mask absorber defect size requirement at 0.1 μm design rules