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Thin Solid Films

Volumn 338, Issue 1-2, 1999, Pages 304-313

Room temperature oxidation behavior of TiN thin films

(4) Logothetidis, S a Meletis, E I b Stergioudis, G a Adjaottor, A A b

a ARISTOTLE UNIVERSITY OF THESSALONIKI (Greece)

b LOUISIANA STATE UNIVERSITY (United States)

Author keywords

Magnetron sputtering; TIN films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRIC POTENTIAL; ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; OXIDATION; STOICHIOMETRY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM NITRIDE FILMS;

SEMICONDUCTING FILMS;

EID: 0032715346 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00975-4 Document Type: Article

Times cited : (113)

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